Cleanova Micronics is pleased to announce the debut of CLEANOVA OMNI™, a patent-pending feed interface system engineered to address one of the most critical and often overlooked sources of inefficiency in filter press operations: the point where slurry enters the press.
By addressing performance at the source, CLEANOVA OMNI™ reduces unplanned downtime, improves system reliability, prevents premature filter cloth failure, simplifies maintenance, and is compatible with most plate and press configurations.
Read the full announcement below and learn why CLEANOVA OMNI™ is a smarter foundation for industrial filtration, shifting the focus from reactive maintenance to engineered performance at the source.